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The SHARP mask microscope

The SHARP mask microscope. Top view shows SHARP system at Lawrence Berkeley National Laboratory, and bottom shows 14-nm half-pitch node features (55-nm on the mask) imaged with a 0.42 numerical aperture (4x) zone plate; these were the smallest features available on the test mask.

Credit: 
Lawrence Berkeley National Laboratory
Related center: 
ERC for Extreme Ultraviolet Science and Technology