SEM and AFM images

Figure 1. SEM and AFM images: (a) SEM image of template and corresponding AFM scan of resist showing what appears to be shape retention over larger area. (b) shows a 2.6-nm radius corner on template replicated in the resist and measured at 3.8 nm radius with an AFM. The SEM image shows the sharp corner measured at the base of the pillars on the template. The AFM images show the corresponding top of the feature in imprint resist with each color representing a 2 nm horizontal slice; this location represents the ultra-sharp corner of the imprinted resist.