Nanomanufacturing Companies License Important NASCENT Technologies
Outcome/Accomplishment
A number of important new technologies, each patented and drawing industry interest, were developed at the Nanomanufacturing Systems Center (NASCENT), an NSF-funded Engineering Research Center (ERC) based at the University of Texas at Austin.
Impact/Benefits
Multiple companies have licensed or are in discussion to license NASCENT technologies as they seek to produce nanotechnologies at scale.
Explanation/Background
Already-licensed technologies include large-area roll-to-plate (R2P) and roll-to-roll (R2R) nanoimprint lithography, enabling silicon-grade precision in scalable R2P and R2R nanomanufacturing through nanoimprint lithography. Companies also have licensed adaptive algorithms that help automate complex waveforms for printing nanoscale components through commercially available printheads, using more than 1,000 nozzles in a single pass.
Industry players also have licensed equipment technologies made possible through a process called Atomically-precise Metal-assisted Chemical Etching (MacEtch), including both liquid and vapor forms. Applications include low-cost nanofabrication in conjunction with nanoimprint for advanced semiconductor integration, in front-end etching of silicon nanostructures, and in energy related production.
Location
Austin, Texaswebsite
Start Year
Advanced Manufacturing
Lead Institution
Core Partners
Fact Sheet
Outcome/Accomplishment
A number of important new technologies, each patented and drawing industry interest, were developed at the Nanomanufacturing Systems Center (NASCENT), an NSF-funded Engineering Research Center (ERC) based at the University of Texas at Austin.
Location
Austin, Texaswebsite
Start Year
Advanced Manufacturing
Lead Institution
Core Partners
Fact Sheet
Impact/benefits
Multiple companies have licensed or are in discussion to license NASCENT technologies as they seek to produce nanotechnologies at scale.
Explanation/Background
Already-licensed technologies include large-area roll-to-plate (R2P) and roll-to-roll (R2R) nanoimprint lithography, enabling silicon-grade precision in scalable R2P and R2R nanomanufacturing through nanoimprint lithography. Companies also have licensed adaptive algorithms that help automate complex waveforms for printing nanoscale components through commercially available printheads, using more than 1,000 nozzles in a single pass.
Industry players also have licensed equipment technologies made possible through a process called Atomically-precise Metal-assisted Chemical Etching (MacEtch), including both liquid and vapor forms. Applications include low-cost nanofabrication in conjunction with nanoimprint for advanced semiconductor integration, in front-end etching of silicon nanostructures, and in energy related production.